Memory circuit and method of operating same

ABSTRACT

A method of operating a memory circuit includes enabling a first row of select transistors, disabling a second row of select transistors, enabling a first row of memory cells in response to a first word line signal, and disabling a second row of memory cells in response to a second word line signal. Enabling the first row of select transistors includes turning on a first select transistor in the first row of select transistors in response to a first select line signal thereby electrically coupling a first local bit line and a global bit line to each other. Disabling the second row of select transistors includes turning off a second select transistor in the second row of select transistors in response to a second select line signal thereby electrically decoupling a second local bit line and the global bit line from each other.

PRIORITY CLAIM

The present application is a divisional of U.S. application Ser. No.17/154,514, filed Jan. 21, 2021, now U.S. Pat. No. 11,521,663, issuedDec. 6, 2022, which claims the benefit of U.S. Provisional ApplicationNo. 63/057,069, filed Jul. 27, 2020, which are herein incorporated byreference in their entireties.

BACKGROUND

The semiconductor integrated circuit (IC) industry has produced a widevariety of digital devices to address issues in a number of differentareas. Some of these digital devices, such as memory macros, areconfigured for the storage of data. As ICs have become smaller and morecomplex, the resistance of conductive lines within these digital devicesare also changed affecting the operating voltages of these digitaldevices and overall IC performance.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is a perspective view of a memory circuit, in accordance withsome embodiments.

FIG. 2A is a circuit diagram of a memory circuit, in accordance withsome embodiments.

FIGS. 2B-2C are corresponding circuit diagrams of corresponding portionsof the memory circuit of FIG. 2A, simplified for ease of illustration.

FIG. 3A is a circuit diagram of a memory circuit, in accordance withsome embodiments.

FIG. 3B is a timing diagram of waveforms of a memory circuit, inaccordance with some embodiments.

FIG. 4 is a circuit diagram of a memory circuit, in accordance with someembodiments.

FIG. 5A is a circuit diagram of a memory circuit, in accordance withsome embodiments.

FIG. 5B is a corresponding circuit diagram of a corresponding portion ofthe memory circuit of FIG. 5A, simplified for ease of illustration.

FIG. 6A is a circuit diagram of a memory circuit, in accordance withsome embodiments.

FIG. 6B is a corresponding circuit diagram of a corresponding portion ofthe memory circuit of FIG. 6A, simplified for ease of illustration.

FIG. 7A is a circuit diagram of a memory circuit, in accordance withsome embodiments.

FIG. 7B is a corresponding circuit diagram of a corresponding portionsof memory circuit, simplified for ease of illustration.

FIG. 8 is a diagram of a memory cell device, in accordance with someembodiments.

FIG. 9 is a diagram of a memory cell device, in accordance with someembodiments.

FIG. 10 is a flowchart of a method of operating a circuit, in accordancewith some embodiments.

DETAILED DESCRIPTION

The following disclosure provides different embodiments, or examples,for implementing features of the provided subject matter. Specificexamples of components, materials, values, steps, arrangements, or thelike, are described below to simplify the present disclosure. These are,of course, merely examples and are not limiting. Other components,materials, values, steps, arrangements, or the like, are contemplated.For example, the formation of a first feature over or on a secondfeature in the description that follows may include embodiments in whichthe first and second features are formed in direct contact, and may alsoinclude embodiments in which additional features may be formed betweenthe first and second features, such that the first and second featuresmay not be in direct contact. In addition, the present disclosure mayrepeat reference numerals and/or letters in the various examples. Thisrepetition is for the purpose of simplicity and clarity and does not initself dictate a relationship between the various embodiments and/orconfigurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

In accordance with some embodiments, a memory circuit includes a firstmemory cell on a first layer, a second memory cell on a second layer, afirst select transistor on a third layer, a second select transistor ona fourth layer, a local bit line, a global bit line, a local source lineand a global source line.

In some embodiments, the local bit line is coupled to the first memorycell, the second memory cell and the first select transistor. In someembodiments, the global bit line is coupled to the first selecttransistor.

In some embodiments, the local source line is coupled to the firstmemory cell, the second memory cell and the second select transistor. Insome embodiments, the global source line is coupled to the second selecttransistor.

In some embodiments, the global bit line is coupled to the local bitline, the first memory cell and the second memory cell by the firstselect transistor. In some embodiments, the global source line iscoupled to the local source line, the first memory cell and the secondmemory cell by the second select transistor.

In some embodiments, the first and second select transistors are enabledfor a read operation, and other select transistors in other rows of thememory circuit are disabled for the read operation.

In some embodiments, by enabling the first and second select transistorfor the read operation, and by disabling other select transistors inother rows of the memory circuit for the read operation, the local bitline/source line loading of the disabled select transistors is reducedcompared to other approaches. In some embodiments, by reducing the localbit line/source line loading, the total bit line/source line loading andcapacitance of memory circuit is reduced thereby causing the pre-chargeand sensing speed of memory circuit to improve compared to otherapproaches.

Memory Circuit

FIG. 1 is a perspective view of a memory circuit 100, in accordance withsome embodiments. In the embodiment of FIG. 1 , memory circuit 100 is amemory macro.

Memory circuit 100 includes a memory cell array 102, a select gate array104 and a select gate array 106.

Memory cell array 102 is connected to select gate array 104 and selectgate array 106. Memory cell array 102 is above select gate array 104.Select gate array 106 is above memory cell array 102. Memory cell array102 is separated from select gate array 104 and select gate array 106 byinsulating region 120. In some embodiments, select gate array 104 is ona first layer of memory circuit 100. In some embodiments, memory cellarray 102 is on a second layer of memory circuit 100 above the firstlayer. In some embodiments, memory cell array 102 is on a third layer ofmemory circuit 100 above the first layer and the second layer.

Each memory cell in the memory cell array 102 is electrically connectedto a corresponding select gate of the select gate array 104 and acorresponding select gate of the select gate array 106.

Memory cell array 102 comprises a three dimensional (3D) array of memorycells having M rows and C columns, and arranged on F layers of memorycircuit 100, where M, C and F are positive integers.

The columns C of memory cells (collectively referred to as “memory cellsMC”) in memory cell array 102 are arranged in a first direction Y. Therows M of memory cells MC in memory cell array 102 are arranged in asecond direction X. The layers F of memory cells MC in memory cell array102 are arranged in a third direction Z.

At least one of the first direction Y, the second direction X or thethird direction Z is different from another of at least the firstdirection Y, the second direction X or the third direction Z. In someembodiments, at least one of the first direction Y, the second directionX or the third direction Z is perpendicular to another of at least thefirst direction Y, the second direction X or the third direction Z.

Memory cell array 102 comprises memory cell arrays 102[0], . . . ,102[F-1] arranged on a corresponding layer 0, . . . , F-1 of layers F ofmemory cell array 102. For example, each memory cell array 102[0], . . ., 102[F-1] includes an array of memory cells MC arranged on acorresponding layer 0, . . . , F-1 of layers F. Memory cell arrays 102herein are denoted by 102[layer or floor number].

Each memory cell array 102[0], . . . , 102[F-1] of memory cell array 102is separated from another memory cell array 102[0], . . . , 102[F-1] ofmemory cell array 102 in the third direction Z by insulating region 120.

Each memory cell array 102[0], . . . , 102[F-1] of memory cell array 102includes an array of memory cells MC[0, 0, layer], MC[1, 0, layer], . .. , MC[C-1, 0, layer], . . . , MC[0, M-1, layer], MC[1, M-1, layer], . .. , MC[C-1, M-1, layer] having M rows, and C columns on a correspondinglayer 0, . . . , F-1 of layers F. Memory cells MC herein are denoted byMC[column number, row number, layer or floor number]. For example,memory cell array 102[0] includes an array of memory cells MC[0, 0, 0],MC[1, 0, 0], . . . , MC[C-1, 0, 0], . . . , MC[0, M-1, 0], MC[1, M-1,0], . . . , MC[C-1, M-1, 0] on corresponding layer 0.

The rows of memory cells MC in each memory cell array 102[0], . . . ,102[F-1] are arranged in the second direction X. The columns of cells ineach memory cell array 102[0], . . . , 102[F-1] are arranged in thefirst direction Y. In some embodiments, each memory cell MC in memorycell array 102 is configured to store a corresponding bit of data.

In some embodiments, at least one memory cell array 102[0], . . . ,102[F-1] of memory cell array 102 is the same as at least another memorycell array 102[0], . . . , 102[F-1] of memory cell array 102. In someembodiments, at least one memory cell array 102[0], . . . , 102[F-1] ofmemory cell array 102 is different from at least another memory cellarray 102[0], . . . , 102[F-1] of memory cell array 102.

In some embodiments, memory cell array 102 is a non-volatilerandom-access memory (NVRAM) array. In some embodiments, each memorycell in memory cell array 102 corresponds to a thin film transistor(TFT). In some embodiments, each memory cell in memory cell array 102corresponds to a ferroelectric resistive random-access memory (FeRAM)cell. In some embodiments, each memory cell in memory cell array 102corresponds to a ferroelectric field effect transistor (FeFET) memorycell. In some embodiments, each memory cell in memory cell array 102corresponds to a magneto-resistive random-access memory (MRAM) cell. Insome embodiments, each memory cell in memory cell array 102 correspondsto a resistive random-access memory (RRAM) cell. Different types ofmemory cells in memory cell array 102 are within the contemplated scopeof the present disclosure. For example, in some embodiments, each memorycell in memory cell array 102 is a static random access memory (SRAM).In some embodiments, each memory cell in memory cell array 102corresponds to a dynamic random access memory (DRAM) cell. In someembodiments, each memory cell in memory cell array 102 corresponds to aphase change memory cell. In some embodiments, each memory cell inmemory cell array 102 corresponds to a charge-based memory cell. Otherconfigurations of memory cell array 102 are within the scope of thepresent disclosure.

Each memory cell array in each corresponding layer of memory cell array102 further includes M word lines (collectively referred to as “wordlines WL”) extending in the second direction X. Word lines WL herein aredenoted by WL[row number]_FL[floor number]. Within each layer of memorycell array 102, M word lines are coupled to a corresponding row ofmemory cells of memory cell array 102[0], . . . , 102[F-1]. For example,memory cell array 102[0] further includes M word lines WL[0]_FL[0],WL[1]_FL[0] . . . , WL[M-1]_FL[0] coupled to a corresponding row ofmemory cells in layer 0 of memory cell array 102. Similarly, memory cellarray 102[F-1] further includes M word lines WL[0]_FL[F-1],WL[1]_FL[F-1] . . . , WL[M-1]_FL[F-1] coupled to a corresponding row ofmemory cells in layer F-1 of memory cell array 102. Memory cell array102 has F*M word lines WL.

Each row of memory cells in memory cell array 102[0] is associated witha corresponding word line of word lines WL[0]_FL[0], WL[1]_FL[0] . . . ,WL[M-1]_FL[0] in layer 0 of memory cell array 102. Similarly, each rowof memory cells in memory cell array 102[F-1] is associated with acorresponding word line of word lines WL[0]_FL[F-1], WL[1]_FL[F-1] . . ., WL[M-1]_FL[F-1] in layer F-1 of memory cell array 102. Otherconfigurations of word lines WL are within the scope of the presentdisclosure.

Memory cell array 102 further includes bit lines BL[0, 0], BL[1, 0], . .. , BL[C-1, 0], . . . , BL[0, M-1], BL[1, M-1], . . . , BL[C-1, M-1](collectively referred to as “bit lines BL”) coupled to a correspondingcolumn and a corresponding row of memory cells in memory cell array 102.Bit lines BL herein are denoted by BL[column number, row number]. Forease of illustration, some of the bit lines in memory cell array 102 arenot shown in FIG. 1 . Memory cell array 102 has C*M bit lines BL. Insome embodiments, bit lines BL are also referred to as local bit lines.

Each column and each row in memory cell array 102 is associated with acorresponding bit line. Each bit line BL extends in the third directionZ.

Bit lines BL electrically couple corresponding memory cells located ondifferent layers of memory cell array 102 to each other and to acorresponding select gate of select gate array 104. For example, eachmemory cell in row 0 and column 0 of memory cell array 102 iselectrically coupled together by bit line BL[0, 0], and are furthercoupled to corresponding select gate SG[0, 0] of select gate array 104.Similarly, each memory cell in row M-1 and column C-1 of memory cellarray 102 is electrically coupled together by bit line BL[C-1, M-1], andare further coupled to corresponding select gate SG[C-1, M-1] of selectgate array 104. Other configurations of bit lines BL are within thescope of the present disclosure.

Memory cell array 102 further includes source lines SL[0, 0], SL[1, 0],. . . , SL[C-1, 0], . . . , SL[0, M-1], SL[1, M-1], . . . , SL[C-1, M-1](collectively referred to as “source lines SL”) coupled to acorresponding column and a corresponding row of memory cells in memorycell array 102. Source lines SL herein are denoted by SL[column number,row number]. For ease of illustration, some of the source lines inmemory cell array 102 are not shown in FIG. 1 . Memory cell array 102has C*M source lines SL. In some embodiments, source lines SL are alsoreferred to as local source lines.

Each column and each row in memory cell array 102 is associated with acorresponding source line. Each source line SL extends in the thirddirection Z.

Source lines SL electrically couple corresponding memory cells locatedon different layers of memory cell array 102 to each other and to acorresponding select gate of select gate array 106. For example, eachmemory cell in row 0 and column 0 of memory cell array 102 iselectrically coupled together by source line SL[0, 0], and are furthercoupled to corresponding select gate SG*[0, 0] of select gate array 106.Similarly, each memory cell in row M-1 and column C-1 of memory cellarray 102 is electrically coupled together by source line SL[C-1, M-1],and are further coupled to corresponding select gate SG*[C-1, M-1] ofselect gate array 106. Other configurations of source lines SL arewithin the scope of the present disclosure.

Select gate array 104 comprises an array of select gates SG[0,0], SG[1,0], . . . , SG[C-1, 0], . . . , SG[0, M-1], SG[1, M-1], . . . , SG[C-1,M-1] (collectively referred to as “select gates SG”) having M rows and Ccolumns, where M and C are positive integers. Select gates SG herein aredenoted by SG[column number, row number].

The columns C of select gates SG in select gate array 104 are arrangedin the first direction Y. The rows M of select gates SG in select gatearray 104 are arranged in the second direction X. In some embodiments,select gate array 104 is arranged on the first layer of memory circuit100. For ease of illustration, some of the select gates in select gatearray 104 are not labelled in FIG. 1 . Select gate array 104 has C*Mselect gates SG.

In some embodiments, each select gate SG in select gate array 104 issimilar to a corresponding memory cell in memory cell array 102, andsimilar detailed description is omitted. In some embodiments, eachselect gate SG includes a select transistor. In some embodiments, eachselect gate SG includes an n-type transistor, a p-type transistor or atransmission gate.

Each select gate SG in select gate array 104 is electrically coupled tocorresponding memory cells MC located on different layers of memory cellarray 102 by corresponding bit lines BL. For example, select gate SG[0,0] of select gate array 104 is electrically coupled to each memory cellMC in row 0 and column 0 of memory cell array 102 by bit line BL[0, 0].For example, select gate SG[C-1, M-1] of select gate array 104 iselectrically coupled to each memory cell MC in row M-1 and column C-1 ofmemory cell array 102 by bit line BL[C-1, M-1].

Select gate array 104 further includes M select lines SG[0], SG[1], . .. , SG[M-1] (collectively referred to as “select line SGL”) coupled to acorresponding row of select gates in select gate array 104. Select linesSGL herein are denoted by SG[row number].

Each row in select gate array 104 is associated with a correspondingselect line. Each select line is configured to control the correspondingrow of select gates in select gate array 104. Each select line SGLextends in the second direction X. For ease of illustration, some of theselect lines in select gate array 104 are not labelled in FIG. 1 .Select gate array 104 has M select lines SGL.

In some embodiments, each select line in select gate array 104 issimilar to a corresponding word line WL in memory cell array 102, andsimilar detailed description is omitted. Other configurations of selectgate array 104 or select lines SGL are within the scope of the presentdisclosure.

Select gate array 106 comprises an array of select gates SG*[0,0],SG*[1, 0], . . . , SG*[C-1, 0], . . . , SG*[0, M-1], SG*[1, M-1], . . ., SG*[C-1, M-1] (collectively referred to as “select gates SG*”) havingM rows and C columns. Select gates SG* herein are denoted by SG*[columnnumber, row number].

The columns C of select gates SG* in select gate array 106 are arrangedin the first direction Y. The rows M of select gates SG* in select gatearray 106 are arranged in the second direction X. In some embodiments,select gate array 106 is arranged on the third layer of memory circuit100. For ease of illustration, some of the select gates in select gatearray 106 are not labelled in FIG. 1 . Select gate array 106 has C*Mselect gates SG*.

In some embodiments, each select gate SG* in select gate array 106 issimilar to a corresponding memory cell in memory cell array 102 or acorresponding select gate in select gate array 104, and similar detaileddescription is omitted. In some embodiments, each select gate SG*includes a select transistor. In some embodiments, each select gate SG*includes an n-type transistor, a p-type transistor or a transmissiongate.

Each select gate SG* in select gate array 106 is electrically coupled tocorresponding memory cells MC located on different layers of memory cellarray 102 by corresponding source lines SL. For example, select gateSG*[0, 0] of select gate array 106 is electrically coupled to eachmemory cell MC in row 0 and column 0 of memory cell array 102 by sourceline SL[0, 0]. For example, select gate SG*[C-1, M-1] of select gatearray 106 is electrically coupled to each memory cell MC in row M-1 andcolumn C-1 of memory cell array 102 by source line SL[C-1, M-1].

Select gate array 106 further includes M select lines SG*[0], SG*[1], .. . , SG*[M-1] (collectively referred to as “select line SGL*”) coupledto a corresponding row of select gates in select gate array 106. Selectlines SGL* herein are denoted by SG*[row number].

Each row in select gate array 106 is associated with a correspondingselect line. Each select line is configured to control the correspondingrow of select gates in select gate array 106. Each select line SGL*extends in the second direction X. For ease of illustration, some of theselect lines in select gate array 106 are not labelled in FIG. 1 .Select gate array 106 has M select lines SGL*.

In some embodiments, each select line SGL* in select gate array 106 issimilar to a corresponding word line WL in memory cell array 102 or acorresponding select line SGL, and similar detailed description isomitted. Other configurations of select gate array 106 or select linesSGL* are within the scope of the present disclosure.

Memory cell array 102 further includes C global bit lines GBL[0],GBL[1], . . . , GBL[C-1] (collectively referred to as “global bit linesGBL”) coupled to a corresponding column of select gates in select gatearray 104. Global bit lines GBL herein are denoted by GBL[columnnumber]. Each column in select gate array 104 is associated with acorresponding global bit line.

Global bit line GBL[0] is electrically coupled to column 0 of selectgates of select gate array 104. Stated differently, rows 0 through M-1of select gate array 104 in column 0 of select gate array 104 arecoupled together by global bit line GBL[0].

Similarly, global bit line GBL[C-1] is electrically coupled to columnC-1 of select gates of select gate array 104. Stated differently, rows 0through M-1 of select gate array 104 in column C-1 of select gate array104 are coupled together by global bit line GBL[C-1].

Each column of select gates of select gate array 104 is configured toselectively couple the corresponding global bit line and thecorresponding column of local bit lines. For example, column 0 of selectgates SG[0, 0], SG[1,0], . . . , SG[C-1,0] of select gate array 104 isconfigured to selectively couple the corresponding global bit lineGBL[0] and the corresponding column of local bit lines BL[0,0], BL[0,1],. . . , BL[0,M-1].

Similarly, column C-1 of select gates SG[C-1,0], SG[C-1,1], . . . ,SG[C-1,M-1] of select gate array 104 is configured to selectively couplebetween the corresponding global bit line GBL[C-1] and the correspondingcolumn of local bit lines BL[C-1,0], BL[C-1,1], . . . , BL[C-1,M-1].

Each global bit line GBL includes a conductive portion 130 that extendsin at least the first direction Y, and M conductive portions 132[0],132[1], . . . , 132[M-1] that extend in the third direction Z, and arecoupled to corresponding select gates of select gate array 104 and theconductive portion 130. For example, global bit line GBL[C-1] includes aconductive portion 130 that extends in at least the first direction Y,and conductive portions 132[0], 132[1], . . . , 132[M-1] (hereinafterreferred to as a “set of conductive portions 132”) that extend in thethird direction Z, are coupled to corresponding select gates SG[C-1,0],SG[C-1,1], . . . , SG[C-1,M-1] of select gate array 104 and conductiveportion 130. For ease of illustration, some of the conductive portions130 and conductive portions 132[0], 132[1], . . . , 132[M-1] in globalbit lines GBL are not shown in FIG. 1 .

Other configurations of at least global bit line GBL, conductive portion130 or set of conductive portions 132 are within the scope of thepresent disclosure.

Memory cell array 102 further includes C global source lines GSL[0],GSL[1], . . . , GSL[C-1] (collectively referred to as “global sourcelines GSL”) coupled to a corresponding column of select gates in selectgate array 106. Global source lines GSL herein are denoted by GSL[columnnumber]. Each column in select gate array 106 is associated with acorresponding global source line.

Global source line GSL[0] is electrically coupled to column 0 of selectgates of select gate array 106. Stated differently, rows 0 through M-1of select gate array 106 in column 0 of select gate array 106 arecoupled together by global source line GSL[0].

Similarly, global source line GSL[C-1] is electrically coupled to columnC-1 of select gates of select gate array 106. Stated differently, rows 0through M-1 of select gate array 106 in column C-1 of select gate array106 are coupled together by global source line GSL[C-1].

Each column of select gates of select gate array 106 is configured toselectively couple the corresponding global source line and thecorresponding column of local source lines. For example, column 0 ofselect gates SG[0, 0], SG[1,0], . . . , SG[C-1,0] of select gate array106 is configured to selectively couple the corresponding global sourceline GSL[0] and the corresponding column of local source lines SL[0,0],SL[0,1], . . . , SL[0,M-1].

Similarly, column C-1 of select gates SG[C-1,0], SG[C-1,1], . . . ,SG[C-1,M-1] of select gate array 106 is configured to selectively couplethe corresponding global source line GSL[C-1] and the correspondingcolumn of local source lines SL[C-1,0], SL[C-1,1], . . . , SL[C-1,M-1].

Each global source line GSL includes a conductive portion 140 thatextends in at least the first direction Y, and M conductive portions142[0], 142[1], . . . , 142[M-1] that extend in the third direction Z,and are coupled to corresponding select gates of select gate array 106and the conductive portion 140. For example, global source line GSL[C-1]includes a conductive portion 140 that extends in at least the firstdirection Y, and conductive portions 142[0], 142[1], . . . , 142[M-1](hereinafter referred to as a “set of conductive portions 142”) thatextend in the third direction Z, are coupled to corresponding selectgates SG*[C-1,0], SG*[C-1,1], . . . , SG*[C-1,M-1] of select gate array106 and conductive portion 140. For ease of illustration, some of theconductive portions 140 and conductive portions 142[0], 142[1], . . . ,142[M-1] in global source lines GSL are not shown in FIG. 1 .

Other configurations of at least global source line GSL, conductiveportion 140 or set of conductive portions 142 are within the scope ofthe present disclosure.

Other configurations of memory circuit 100 are within the scope of thepresent disclosure. In some embodiments, select gate array 104 or 106 isnot included in memory circuit 100. In some embodiments, select gatearray 104 or 106 is between one or more layers F of memory cell array102.

FIG. 2A is a circuit diagram of a memory circuit 200, in accordance withsome embodiments. FIGS. 2B-2C are corresponding circuit diagrams ofcorresponding portions 200B-200C of memory circuit 200, simplified forease of illustration. Portion 200B includes one or more features ofmemory circuit 200 of FIG. 2A for column 0 and rows 0-2 of memorycircuit 200, and portion 200C includes one or more features of memorycircuit 200 of FIG. 2A for columns 0-2 and row 0 of memory circuit 200.

Memory circuit 200 is an embodiment of memory circuit 100 of FIG. 1expressed in a schematic diagram, and similar detailed description istherefore omitted.

Memory circuit 200 relates to memory circuit 100 of FIG. 1 . Componentsthat are the same or similar to those in one or more of FIGS. 1-10(shown below) are given the same reference numbers, and detaileddescription thereof is thus omitted. For ease of illustration, some ofthe labeled elements of FIGS. 2A-2C are not labelled in each of FIGS.2A-2C. In some embodiments, FIGS. 2A-2C include additional elements notshown in FIGS. 2A-2C.

Memory circuit 200 includes a memory cell array 202, a select gate array204 and a select gate array 206.

Memory cell array 202 is an embodiment of memory cell array 102 of FIG.1 , select gate array 204 is an embodiment of select gate array 104 ofFIG. 1 , select gate array 206 is an embodiment of select gate array 106of FIG. 1 , and similar detailed description is therefore omitted.

Memory cell array 202 includes memory cell arrays 202[0], . . . ,202[F-1] arranged on a corresponding layer 0, . . . , F-1 of layers F ofmemory cell array 202. Memory cell arrays 202[0], . . . , 202[F-1] areembodiments of memory cell arrays 102[0], . . . , 102[F-1] of FIG. 1 ,and similar detailed description is therefore omitted.

Each memory cell array 202[0], . . . , 202[F-1] of memory cell array 202includes an array of memory cells MC[0, 0, layer], MC[1, 0, layer], . .. , MC[C-1, 0, layer], . . . , MC[0, M-1, layer], MC[1, M-1, layer], . .. , MC[C-1, M-1, layer] having M rows, and C columns on a correspondinglayer 0, . . . , F-1 of layers F.

Each memory cell MC includes a corresponding transistor (collectivelyreferred to as “transistors 210”). Transistors 210 herein are denoted by210[column number, row number, layer or floor number]. For example,memory cell array 202[0] includes an array of transistors 210[0, 0, 0],210[1, 0, 0], . . . , 210[C-1, 0, 0], . . . , 210[0, M-1, 0], 210[1,M-1, 0], . . . , 210[C-1, M-1, 0] on corresponding layer 0. For ease ofillustration, some transistors 210 of memory cell array 202 are notlabelled in FIG. 2A.

Each of transistors 210 are n-type transistors. In some embodiments,each of transistors 210 are N-type Metal Oxide Semiconductor (NMOS)transistors. Other transistor types are within the scope of the presentdisclosure. In some embodiments, each of transistors 210 are p-typetransistors. In some embodiments, each of transistors 210 are P-typeMetal Oxide Semiconductor (PMOS) transistors.

Each transistor 210 includes a gate coupled to a corresponding word lineWL, a source coupled to at least a corresponding source line SL and adrain coupled to at least a corresponding bit line BL. Other transistorterminals are within the scope of the present disclosure. For example,reference to the drains and sources of a same transistor in the presentdisclosure can be changed to a source and a drain of the sametransistor.

For each layer of memory cell array 202, each transistor 210 has a gatecoupled to a word line within the corresponding layer. For example, inlayer 0, each transistor 210 has a corresponding gate coupled to a wordline within layer 0. Stated differently, word lines WL[0]_FL[0],WL[1]_FL[0] . . . , WL[M-1]_FL[0] are coupled to a corresponding row oftransistors (e.g., memory cells) in layer 0 of memory cell array 102 byeach gate of the corresponding transistor. Each gate is configured toreceive a corresponding word line signal (not labelled) on thecorresponding word line WL.

A pillar includes memory cells in each layer of memory cell array 202within a specific row and a specific column, a select gate of selectgate array 204 within the same specific row and same specific column,and a select gate of select gate array 206 within the same specific rowand same specific column. For example, a pillar 250 (FIG. 2B) in row 0and column 0 of memory circuit 200 corresponds to memory cells210[0,0,0], 210[0,0,1], . . . , 210[0,0,F-1] in row 0 and column 0 ofeach layer of memory cell array 202, select transistor 212[0,0] in row 0and column 0, and select transistor 214[0,0] in row 0 and column 0.

Within each pillar, a drain of each corresponding memory cell on eachlayer of memory cell array 202 is coupled together by a local bit linein the pillar, and is further coupled to a corresponding drain/source ofa select gate of select gate array 204 in the pillar. For example, adrain of corresponding memory cells 210[0,0,0], 210[0,0,1], . . . ,210[0,0,F-1] in row 0 and column 0 of each layer of memory cell array202 are coupled together by bit line BL[0,0], and are further coupled toa drain/source of select transistor 212[0,0] in pillar 250 (FIG. 2B).

Within each pillar, a source of each corresponding memory cell on eachlayer of memory cell array 202 is coupled together by a local sourceline in the pillar, and is further coupled to a correspondingdrain/source of a select gate of select gate array 204 in the pillar.For example, a source of corresponding memory cells 210[0,0,0],210[0,0,1], . . . , 210[0,0,F-1] in row 0 and column 0 of each layer ofmemory cell array 202 are coupled together by source line SL[0,0], andare further coupled to a drain/source of select transistor 214[0,0] inpillar 250 (FIG. 2B).

Select gate array 204 includes array of select gates SG[0,0], SG[1, 0],. . . , SG[C-1, 0], . . . , SG[0, M-1], SG[1, M-1], . . . , SG[C-1,M-1], described in FIG. 1 .

Each select gate SG[0,0], SG[1, 0], . . . , SG[C-1, 0], . . . , SG[0,M-1], SG[1, M-1], . . . , SG[C-1, M-1] of select gate array 204 includesa corresponding select transistor 212[0,0], 212[1, 0], . . . , 212[C-1,0], . . . , 212[0, M-1], 212[1, M-1], . . . , 212[C-1, M-1](collectively referred to as “select transistors 212”). Selecttransistors 212 herein are denoted by 212[column number, row number].For ease of illustration, some select transistors 212 of memory circuit200 are not labelled in FIG. 2A.

Each column of select transistors 212 is configured to selectivelycouple the corresponding global bit line and the corresponding column oflocal bit lines together. For example, column 0 of select transistors212[0, 0], 212[0,1], . . . , 212[0,M-1] is configured to selectivelycouple the corresponding global bit line GBL[0] and the correspondingcolumn of local bit lines BL[0,0], BL[0,1], . . . , BL[0,M-1].

Each of select transistors 212 are n-type transistors. In someembodiments, each of select transistors 212 are NMOS transistors. Othertransistor types are within the scope of the present disclosure. In someembodiments, each of select transistors 212 are p-type transistors. Insome embodiments, each of select transistors 212 are PMOS transistors.

Each select transistor 212 includes a gate coupled to a correspondingselect line SGL, a drain/source coupled to at least a correspondingglobal bit line GBL and a source/drain coupled to at least acorresponding bit line BL.

Each gate of a corresponding row of select transistors 212 iselectrically coupled to a corresponding select line SG[0], SG[1], . . ., SG[M-1], and is configured to receive a corresponding select linesignal SLS[0], SLS[1], . . . , SLS[M-1]. Each select transistor ofselect transistors 212 is enabled or disabled in response to thecorresponding select line signal SLS[0], SLS[1], . . . , SLS[M-1]received on the corresponding select line SG[0], SG[1], . . . , SG[M-1].

If enabled, a select transistor of select transistors 212 electricallycouples the corresponding global bit line and the corresponding columnof local bit lines. If disabled, the select transistor of selecttransistors 212 electrically decouples the corresponding global bit lineand the corresponding column of local bit lines. In some embodiments,one row of select transistors 212 is enabled for a duration of time(between time T1-T2 in FIG. 3C), and the other rows of selecttransistors 212 are disabled for the same duration of time (between timeT1-T2 in FIG. 3C).

Within each pillar, a drain/source of each corresponding selecttransistor 212 is coupled to a corresponding global bit line GBL in thepillar. For example, a drain/source of corresponding select transistor212[0,0] in row 0 and column 0 is coupled to global bit line GBL[0] inpillar 250 (FIGS. 2B-2C).

Within each column, a global bit line GBL is electrically coupled toeach drain/source of each corresponding select transistor 212 within thecolumn. For example, in column 0, global bit line GBL[0] is electricallycoupled to each drain/source of select transistors 212[0,0], 212[0,1], .. . , 212[0,M-1] in column 0. Thus, each select transistor 212 within acorresponding column is configured to share the corresponding global bitline GBL.

Within each pillar, a source/drain of each corresponding selecttransistor 212 is coupled to a corresponding local bit line BL in thepillar. For example, a source/drain of corresponding select transistor212[0,0] in row 0 and column 0 is coupled to local bit line BL[0,0] inpillar 250 (FIGS. 2B-2C).

Within each pillar, the source/drain of each corresponding selecttransistor 212 is coupled to the drains of each corresponding memorycell on each layer of memory cell array 202 in the pillar by thecorresponding local bit line BL. For example, the source/drain ofcorresponding select transistor 212[0,0] in row 0 and column 0 iscoupled to the drains of memory cells 210[0,0,0], 210[0,0,1], . . . ,210[0,0,F-1] in row 0 and column 0 of each layer of memory cell array202 in pillar 250 by local bit line BL[0,0]. (FIGS. 2B-2C).

Select gate array 206 includes array of select gates SG*[0,0], SG*[1,0], . . . , SG*[C-1, 0], . . . , SG*[0, M-1], SG*[1, M-1], . . . ,SG*[C-1, M-1], described in FIG. 1 .

Each select gate SG*[0,0], SG*[1, 0], . . . , SG*[C-1, 0], . . . ,SG*[0, M-1], SG*[1, M-1], . . . , SG*[C-1, M-1] of select gate array 206includes a corresponding select transistor 214[0,0], 214[1, 0], . . . ,214[C-1, 0], . . . , 214[0, M-1], 214[1, M-1], . . . , 214[C-1, M-1](collectively referred to as “select transistors 214”). Selecttransistors 214 herein are denoted by 214[column number, row number].For ease of illustration, some select transistors 214 of memory circuit200 are not labelled in FIG. 2A.

Each column of select transistors 214 is configured to selectivelycouple the corresponding global source line and the corresponding columnof local source lines together. For example, column 0 of selecttransistors 214[0, 0], 214[0,1], . . . , 214[0,M-1] is configured toselectively couple the corresponding global source line GSL[0] and thecorresponding column of local source lines SL[0,0], SL[0,1], . . . ,SL[0,M-1].

Each of select transistors 214 are n-type transistors. In someembodiments, each of select transistors 214 are NMOS transistors. Othertransistor types are within the scope of the present disclosure. In someembodiments, each of select transistors 214 are p-type transistors. Insome embodiments, each of select transistors 214 are PMOS transistors.

In some embodiments, at least one select transistor of selecttransistors 212 or 214 includes multiple transistors (e.g., multiplecells) coupled in parallel which thereby enhances the driving currentcapability of the corresponding select gate SG.

In some embodiments, at least one select transistor of selecttransistors 212 or 214 has a same transistor size as at least onetransistor 210 in a corresponding memory cell of memory cell array 202or another select transistor of select transistors 212 or 214. In someembodiments, transistor size includes one or more of a number of fins, achannel length or a channel width. In some embodiments, at least oneselect transistor of select transistors 212 or 214 has a differenttransistor size as at least one transistor 210 in a corresponding memorycell of memory cell array 202 or another select transistor of selecttransistors 212 or 214.

Each select transistor 214 includes a gate coupled to a correspondingselect line SGL*, a drain/source coupled to at least a correspondingglobal source line GSL and a source/drain coupled to at least acorresponding source line SL.

Each gate of a corresponding row of select transistors 214 iselectrically coupled to a corresponding select line SG*[0], SG*[1], . .. , SG*[M-1], and is configured to receive a corresponding select linesignal SLS*[0], SLS*[1], . . . , SLS*[M-1]. Each select transistor ofselect transistors 214 is enabled or disabled in response to thecorresponding select line signal SLS*[0], SLS*[1], . . . , SLS*[M-1]received on the corresponding select line SG*[0], SG*[1], . . . ,SG*[M-1]. In some embodiments, at least select line signal SLS*[0],SLS*[1], . . . , SLS*[M-2) or SLS*[M-1] is equal to at leastcorresponding select line signal SLS[0], SLS[1], . . . , SLS[M-2) orSLS[M-1].

If enabled, a select transistor of select transistors 214 electricallycouples the corresponding global source line and the correspondingcolumn of local source lines. If disabled, the select transistor ofselect transistors 214 electrically decouples the corresponding globalsource line and the corresponding column of local source lines. In someembodiments, one row of select transistors 214 is enabled for a durationof time (between time T1-T2 in FIG. 3C), and the other rows of selecttransistors 214 are disabled for the same duration of time (between timeT1-T2 in FIG. 3C).

In some embodiments, the timing of the enabling or disabling of selecttransistors 212 is synchronized with the timing of the enabling ordisabling of select transistors 214.

Within each pillar, a drain/source of each corresponding selecttransistor 214 is coupled to a corresponding global source line GSL inthe pillar. For example, a drain/source of corresponding selecttransistor 214[0,0] in row 0 and column 0 is coupled to global sourceline GSL[0] in pillar 250 (FIGS. 2B-2C).

Within each column, a global source line GSL is electrically coupled toeach drain/source of each corresponding select transistor 214 within thecolumn. For example, in column 0, global source line GSL[0] iselectrically coupled to each drain/source of select transistors214[0,0], 214[0,1], . . . , 214[0,M-1] in column 0. Thus, each selecttransistor 214 within a corresponding column is configured to share thecorresponding global source line GSL.

Within each pillar, a source/drain of each corresponding selecttransistor 214 is coupled to a corresponding local source line SL in thepillar. For example, a source/drain of corresponding select transistor214[0,0] in row 0 and column 0 is coupled to local source line SL[0,0]in pillar 250 (FIGS. 2B-2C).

Within each pillar, the source/drain of each corresponding selecttransistor 214 is coupled to the sources of each corresponding memorycell on each layer of memory cell array 202 in the pillar by thecorresponding local source line SL. For example, the source/drain ofcorresponding select transistor 214[0,0] in row 0 and column 0 iscoupled to the sources of memory cells 210[0,0,0], 210[0,0,1], . . . ,210[0,0,F-1] in row 0 and column 0 of each layer of memory cell array202 in pillar 250 by local source line SL[0,0]. (FIGS. 2B-2C).

In some embodiments, by enabling one row of select transistors 214 for aduration of time, and by disabling the other rows of select transistors214 in the same column for the same duration of time, the global sourceline GSL in the same column is able to be shared.

In some embodiments, by enabling one row of select transistors 212 for aduration of time, and by disabling the other rows of select transistors212 in the same column for the same duration of time, the local bit lineBL loading of the disabled select transistors 212 is reduced compared toother approaches. Similarly, in some embodiments, by enabling one row ofselect transistors 214 for a duration of time, and by disabling theother rows of select transistors 214 in the same column for the sameduration of time, the local source line SL loading of the disabledselect transistors 214 is reduced compared to other approaches. In someembodiments, by reducing the local BL/SL loading, the total BL/SLloading and capacitance of memory circuit 200 is reduced thereby causingthe pre-charge and sensing speed of memory circuit 200 to improvecompared to other approaches.

FIG. 3A is a circuit diagram of a memory circuit 300A, in accordancewith some embodiments.

Memory circuit 300A is a portion of memory circuit 200 of FIGS. 2A-2C.For example, memory circuit 300A corresponds to rows 0 and 1 of portion200B of memory circuit 200 of FIG. 2B.

FIG. 3B is a timing diagram 300B of waveforms 302, 304, 306 and 308 of amemory circuit, such as portion 300A of memory circuit 200 in FIGS.2A-2C, in accordance with some embodiments.

Memory circuit 300A and timing diagram 300B are an example of enablingone row (e.g., row 0) of select transistors 212 and 214, and disablingthe other rows (e.g., rows 1 through M-1) of select transistors 212 and214 in the same column (column 0).

In some embodiments, FIG. 3B is a timing diagram 300B of waveforms of atleast circuit 100-200 of FIGS. 1 and 2A-2C or memory circuits 400-800 inFIGS. 4-8 , in accordance with some embodiments.

At time T0, each of select line signal SLS[0], select line signalSLS*[0], select line signal SLS[1], select line signal SLS*[1] therebycausing corresponding select transistor 212[0,0], 214[0,0], 212[0,1],214[0,1] to be turned off. By select transistor 212[0,0] being turnedoff, bit line BL[0,0] is not coupled to global bit line GBL[0], and byselect transistor 214[0,0] being turned off, source line SL[0,0] is notcoupled to global source line GSL[0]. By select transistor 212[0,1]being turned off, bit line BL[0,1] is not coupled to global bit lineGBL[0], and by select transistor 214[0,1] being turned off, source lineSL[0,1] is not coupled to global source line GSL[0].

At time T0, each of word line signal WL[0]_FL[0]* of word lineWL[0]_FL[0]*, and word line signals WL[1]_FL[0]* of word lineWL[1]_FL[0]-word line signals WL[1]_FL[F-1]* of word line WL[1]_FL[F-1]are logically low.

At time T1, select line signal SLS[0] and select line signal SLS*[0]transition from logically low to logically high. In response to selectline signal SLS[0] and select line signal SLS*[0] being logically highcauses select transistors 212[0,0] and 214[0,0] to be enabled or turnedon. By select transistor 212[0,0] being turned on, bit line BL[0,0] iscoupled to global bit line GBL[0], and by select transistor 214[0,0]being turned on, source line SL[0,0] is coupled to global source lineGSL[0]. Thus, a current path IBL from the bit line BL[0,0] to the globalbit line GBL[0] is closed, and a current path ISL from the source lineSL[0,0] to the global source line GSL[0] is closed. However, sinceselect transistor 212[0,1] is turned off, a current path from the bitline BL[0,1] to the global bit line GBL[0] is opened, and selecttransistor 214[0,1] is turned off, a current path from the source lineSL[0,1] to the global source line GBL[0] is opened. Thus, one row (e.g.,row 0) of select transistors 212[0,0] and 214[0,0] is selected, and theother rows (e.g., rows 1 through M-1) of select transistors 212[0,1] and214[0,1] in the same column (column 0) are not selected or disabled.

At time T1, word line signal WL[0]_FL[0]* of a selected memory cell(e.g., transistor 210[0,0,0]) also transitions from logically low tologically high. In other words, a selected memory cell MC[0,0,0] inmemory cell array 202[0] is enabled and data can be read from theselected memory cell. In response to word line signal WL[0]_FL[0]* beinglogically high causes transistor 210[0,0,0] to be enabled or turned on.By transistor 210[0,0,0] being turned on, bit line BL[0,0] and sourceline SL[0,0] are together, allowing global bit line GBL[0] and globalsource line GSL[0] to be coupled together.

In some embodiments, one or more memory cells of other layers of memorycell array 202 within the same pillar as memory cell 210 [0,0,0] areunselected. In some embodiments, unselected memory cells of row 0 andcolumn 0 of memory cell array 202 have corresponding logically low wordline signals of corresponding word lines WL[0]_FL[1]-WL[0]_FL[F-1].

In some embodiments, memory cells in other rows of memory cell array 202are unselected. In some embodiments, unselected memory cells in otherrows of memory cell array 202 have corresponding word line signalsWL[1]_FL[0]* through WL[1]_FL[F-1]* that are logically low.

At time T2, select line signal SLS[0] and select line signal SLS*[0]transition from logically high to logically low. In response to selectline signal SLS[0] and select line signal SLS*[0] being logically lowcauses select transistors 212[0,0] and 214[0,0] to be disabled or turnedoff. By select transistor 212[0,0] being turned off, bit line BL[0,0] isdecoupled from global bit line GBL[0], and by select transistor 214[0,0]being turned off, source line SL[0,0] is decoupled from global sourceline GSL[0]. Thus, the current path IBL from the bit line BL[0,0] to theglobal bit line GBL[0] is opened, and the current path ISL from thesource line SL[0,0] to the global source line GBL[0] is opened. Thus,row 0 of select transistors 212[0,0] and 214[0,0] is deselected.

At time T2, word line signal WL[0]_FL[0]* of transistor 210[0,0,0])transitions from logically high to logically low. In other words,selected memory cell MC[0,0,0] in memory cell array 202[0] is disabledor deselected and data can no longer be read from the unselected memorycell. In response to word line signal WL[0]_FL[0]* being logically lowcauses transistor 210[0,0,0] to be disabled or turned off. By transistor210[0,0,0] being turned off, bit line BL[0,0] and source line SL[0,0]are disconnected.

FIG. 4 is a circuit diagram of a memory circuit 400, in accordance withsome embodiments.

Memory circuit 400 is an embodiment of memory circuit 100 of FIG. 1expressed in a schematic diagram, and similar detailed description istherefore omitted.

Memory circuit 400 is a variation of memory circuit 200 of FIGS. 2A-2C.Memory circuit 400 corresponds to a portion of memory circuit 200. Forexample, memory circuit 400 corresponds to column 0 and rows 0-3 ofmemory circuit 200.

In comparison with memory circuit 200, memory circuit 400 furtherincludes pre-decoder circuits 402, select line driver circuits 404,pre-decoder circuits 410 and word line driver circuits 412.

Pre-decoder circuits 402 include pre-decoder circuits 402[0], . . . ,402[3]. In some embodiments, pre-decoder circuits 402 are configured topre-decode portions of addresses in select gate array 204 or 206 thatidentify a row of select gates in select gate arrays 204 and 206. Insome embodiments, the pre-decoder circuits 402 include row decodercircuits (not shown).

Select line driver circuits 404 include select line driver circuits404[0], . . . , 404[3]. In some embodiments, select line driver circuits404 are configured to generate select line signals SLS[0], . . . ,SLS[3]. Each pre-decoder circuit 402[0], . . . , 402[3] is coupled to acorresponding select line driver circuit 404[0], . . . , 404[3].

Each select line driver circuit is coupled to a pair of select gateswithin each corresponding row of memory circuit 400. Each select linedriver circuit 404[0], . . . , 404[3] is coupled to a correspondingselect gate (e.g., select transistor 212[0,0], . . . , 212[0,3]) ofselect gate array 204 by a corresponding select line SG[0], . . . ,SG[3] and to a corresponding select gate (e.g., select transistor214[0,0], . . . , 214[0,3]) of select gate array 206 by a correspondingselect line SG*[0], . . . , SG*[3]. In some embodiments, each selectgate (e.g., select transistor 212[0,0], . . . , 212[0,3]) of select gatearray 204 has a same select line signal (e.g., SLS[0], . . . , SLS[3])as a corresponding select gate (e.g., select transistor 214[0,0], . . ., 214[0,3]) of select gate array 206 in the same row of memory circuit400.

Pre-decoder circuits 410 include pre-decoder circuits 410[0], . . . ,410[3]. In some embodiments, pre-decoder circuits 410 are configured topre-decode portions of addresses in memory cell array 202 that identifya row of memory cells in memory cell array 202. In some embodiments, thepre-decoder circuits 410 include row decoder circuits.

Word line driver circuits 412 include word line driver circuits 412[0],. . . , 412[3]. Each pre-decoder circuit 410[0], . . . , 410[3] iscoupled to a corresponding word line driver circuit 412[0], . . . ,412[3]. In some embodiments, word line driver circuits 412 areconfigured to generate word line signals on corresponding word lines.For example, word line driver circuit 412[0] is configured to generateword line signals on word lines WL[0]_FL[0], . . . , WL[3]_FL[0], andword line driver circuit 412[1] is configured to generate word linesignals on word lines WL[0]_FL[F-1], . . . , WL[3]_FL[F-1].

Each word line driver circuit is coupled to each word line within eachcorresponding row and layer of memory circuit 400. For example, wordline driver circuit 412[0] is coupled to word lines WL[0]_FL[0], . . . ,WL[3]_FL[0] on layer 0 of memory cell array 202. Similarly, word linedriver circuit 412[3] is coupled to word lines WL[0]_FL[F-1], . . . ,WL[3]_FL[F-1] on layer F-1 of memory cell array 202. Stated differently,word line driver circuits 412 are shared by each row of memory cells inthe same layer of memory cell array 202.

In some embodiments, by using at least pre-decoder circuits 402, selectline driver circuits 404, pre-decoder circuits 410 or word line drivercircuits 412 as arranged, memory circuit includes less driver circuits(e.g., select line driver circuits 404 and word line driver circuits412) than other approaches. In some embodiments, by reducing the numberof driver circuits, memory circuit 400 occupies less area than otherapproaches. In some embodiments, the number of driver circuits reducedby memory circuit 400 is at least 70%.

While FIG. 4 was described with respect to 1 column (e.g., column 0) and4 rows (e.g., rows 0-3) of memory circuit 200, the features of memorycircuit 400 are applicable to each of the rows and columns of memorycircuit 200, and are omitted for brevity.

FIG. 5A is a circuit diagram of a memory circuit 500, in accordance withsome embodiments. FIG. 5B is a corresponding circuit diagram of acorresponding portion 500B of memory circuit 500, simplified for ease ofillustration. Portion 500B includes one or more features of memorycircuit 500 of FIG. 5A for column 0 and row 0 of memory circuit 500, andsimilar detailed description is omitted. Portion 500B corresponds to apillar 550.

Memory circuit 500 is a variation of memory circuit 200 of FIGS. 2A-2C.For example, memory circuit 500 corresponds to memory circuit 200without select gate array 204.

Memory circuit 500 is an embodiment of memory circuit 100 of FIG. 1expressed in a schematic diagram, and similar detailed description istherefore omitted.

Memory circuit 500 is a variation of memory circuit 200 of FIGS. 2A-2C.In comparison with memory circuit 200 of FIGS. 2A-2C, memory circuit 500does not include select gate array 204, select transistors 212 andselect lines SG.

By not including select gate array 204, select transistors 212 andselect lines SG, each column of global bit lines GBL is directly coupledto columns of local bit lines BL. For example, global bit line GBL[0]within column 0 is directly coupled to each of local bit lines BL[0,0],BL[0,1], . . . , BL[0,M-1] within column 0 of memory circuit 500.

By not including select gate array 204, select transistors 212 andselect lines SG, each bit line BL within a corresponding column ofmemory circuit 500 are coupled together. For example, each of local bitlines BL[0,0], BL[0,1], . . . , BL[0,M-1] within column 0 of memorycircuit 500 are coupled to each other by global bit line GBL[0].

Within each pillar, the drains of each corresponding memory cell on eachlayer of memory cell array 202 within the pillar is coupled to thecorresponding global bit line GBL by the corresponding local bit lineBL. For example, the drains of corresponding memory cells 210[0,0,0],210[0,0,1], . . . , 210[0,0,F-1] in row 0 and column 0 of each layer ofmemory cell array 202 in pillar 550 (shown in FIG. 5B) is coupled to thecorresponding global bit line GBL[0] in column 0 by the correspondinglocal bit line BL[0,0].

In some embodiments, by including select gate array 206, selecttransistors 214 and select lines SG* in memory circuit 500, one row ofselect transistors 214 in memory circuit 500 is enabled for a durationof time, and other rows of select transistors 214 in the same column aredisabled for the same duration of time thereby reducing the local sourceline SL loading of the disabled select transistors 214 compared to otherapproaches. In some embodiments, by reducing the local SL loading, thetotal SL loading and capacitance of memory circuit 500 is reducedthereby causing the pre-charge and sensing speed of memory circuit 500to improve compared to other approaches.

FIG. 6A is a circuit diagram of a memory circuit 600, in accordance withsome embodiments. FIG. 6B is a corresponding circuit diagram of acorresponding portion 600B of memory circuit 600, simplified for ease ofillustration. Portion 600B includes one or more features of memorycircuit 600 of FIG. 6A for column 0 and row 0 of memory circuit 600, andsimilar detailed description is omitted. Portion 600B corresponds to apillar 650.

Memory circuit 600 is a variation of memory circuit 200 of FIGS. 2A-2C.For example, memory circuit 600 corresponds to memory circuit 200without select gate array 206.

Memory circuit 600 is an embodiment of memory circuit 100 of FIG. 1expressed in a schematic diagram, and similar detailed description istherefore omitted.

Memory circuit 600 is a variation of memory circuit 200 of FIGS. 2A-2C.In comparison with memory circuit 200 of FIGS. 2A-2C, memory circuit 600does not include select gate array 206, select transistors 214 andselect lines SG*.

By not including select gate array 206, select transistors 214 andselect lines SG*, each column of global source lines GSL is directlycoupled to columns of local source lines SL. For example, global sourceline GSL[0] within column 0 is directly coupled to each of local sourcelines SL[0,0], SL[0,1], . . . , SL[0,M-1] within column 0 of memorycircuit 600.

By not including select gate array 206, select transistors 214 andselect lines SG*, each source line SL within a corresponding column ofmemory circuit 600 are coupled together. For example, each of localsource lines SL[0,0], SL[0,1], . . . , SL[0,M-1] within column 0 ofmemory circuit 600 are coupled to each other by global source lineGSL[0].

Within each pillar, the drains of each corresponding memory cell on eachlayer of memory cell array 202 within the pillar is coupled to thecorresponding global source line GSL by the corresponding local sourceline SL. For example, the drains of corresponding memory cells210[0,0,0], 210[0,0,1], . . . , 210[0,0,F-1] in row 0 and column 0 ofeach layer of memory cell array 202 in pillar 650 (shown in FIG. 6B) iscoupled to the corresponding global source line GSL[0] in column 0 bythe corresponding local source line SL[0,0].

In some embodiments, by including select gate array 204, selecttransistors 212 and select lines SG in memory circuit 600, one row ofselect transistors 212 in memory circuit 600 is enabled for a durationof time, and other rows of select transistors 212 in the same column aredisabled for the same duration of time thereby reducing the local bitline BL loading of the disabled select transistors 212 compared to otherapproaches. In some embodiments, by reducing the local BL loading, thetotal BL loading and capacitance of memory circuit 600 is reducedthereby causing the pre-charge and sensing speed of memory circuit 600to improve compared to other approaches.

FIG. 7A is a circuit diagram of a memory circuit 700, in accordance withsome embodiments. FIG. 7B is a corresponding circuit diagram of acorresponding portion 700B of memory circuit 700, simplified for ease ofillustration. Portion 700B includes one or more features of memorycircuit 700 of FIG. 7A for column 0 and row 0 of memory circuit 700, andsimilar detailed description is omitted. Portion 700B corresponds to apillar 750.

Memory circuit 700 is a variation of memory circuit 200 of FIGS. 2A-2C.For example, memory circuit 700 corresponds to memory circuit 200without select gate array 206, and select gate array 204 is positionedbetween two previously adjacent layers of memory cell array 202.

Memory circuit 700 is an embodiment of memory circuit 100 of FIG. 1expressed in a schematic diagram, and similar detailed description istherefore omitted.

Memory circuit 700 is a variation of memory circuit 200 of FIGS. 2A-2C.In comparison with memory circuit 200 of FIGS. 2A-2C, memory circuit 700does not include select gate array 206, select transistors 214 andselect lines SG*, and select gate array 204 is positioned between twolayers of memory cell array 202 that were adjacent in FIG. 2A. In someembodiments, two elements are adjacent to each other if they aredirectly next to each other.

Memory cell array 202 includes F layers (e.g., layers 0, 1, 2, . . . ,F-1) of memory cells. In FIGS. 7A-7B, select gate array 204 ispositioned between layer 1 and layer 2 of memory cell array 202. Otherlayer configurations of memory circuit 700 or select gate array 204 arewithin the scope of the present disclosure. Select gate array 204 can bepositioned between other layers of memory cell array 202 and is withinthe scope of the present disclosure. For example, in some embodiments,select gate array 204 is positioned between layer F-1 and layer F-2 ofmemory cell array 202.

Memory cell array 202 is subdivided into memory cell array 702 a (memorycell array 202[0], 202[1]) positioned below select gate array 204, andmemory cell array 702 b (memory cell array 202[2], 202[F-1]) positionedabove select gate array 204.

By positioning select gate array 204 between layer 1 and layer 2 ofmemory cell array 202, each column of global bit lines GBL is directlycoupled to drain/sources of corresponding transistors 210 (memory cellsMC) positioned on layers of memory cell array 202 below select gatearray 204 within the column of memory cells. For example, global bitline GBL[0] within column 0 is directly coupled to each drain/source oftransistors 210[0,0,0] and 210[0,0,1] within column 0 of memory cellarray 202.

By positioning select gate array 204 between layer 1 and layer 2 ofmemory cell array 202, each column of local bit lines BL is directlycoupled to source/drains of corresponding transistors 210 (memory cellsMC) positioned on layers of memory cell array 202 below select gatearray 204 within the column of memory cells. For example, local bit lineBL[0] within column 0 is directly coupled to each source/drain oftransistors 210[0,0,0] and 210[0,0,1] within column 0 of memory cellarray 202.

Within each pillar, the source/drain of each corresponding selecttransistor 212 is coupled to source/drains of each corresponding memorycell positioned on layers of memory cell array 202 below selecttransistor 212 by the corresponding local bit line BL. For example, asshown in FIG. 7B, in row 0 and column 0, the source/drain ofcorresponding select transistor 212[0,0] positioned above layers 0 and 1of memory cell array 202 is coupled to the source/drains of memory cells210[0,0,0] and 210[0,0,1] of corresponding layers 0 and 1 of memory cellarray 202 in pillar 750 (shown in FIG. 7B) by local bit line BL[0,0].

By positioning select gate array 204 between layer 1 and layer 2 ofmemory cell array 202, each select transistor 212 of SG array 204electrically couples the corresponding local bit line BL and thecorresponding local source line SL together. For example, selecttransistor 212[0,0] of row 0 and column 0 of memory circuit 700electrically couples local bit line BL[0] and local source line SL[0]together.

By positioning select gate array 204 between layer 1 and layer 2 ofmemory cell array 202, each column of global source lines GSL isdirectly coupled to source/drains of corresponding transistors 210(memory cells MC) positioned on layers of memory cell array 202 aboveselect gate array 204 within the column of memory cells. For example, asshown in FIG. 7B, global source line GSL[0] within column 0 is directlycoupled to each source/drain of transistors 210[0,0,F-2] and210[0,0,F-1] within column 0 of memory cell array 202.

By positioning select gate array 204 between layer 1 and layer 2 ofmemory cell array 202, each column of local source lines SL is directlycoupled to drain/sources of corresponding transistors 210 (memory cellsMC) positioned on layers of memory cell array 202 above select gatearray 204 within the column of memory cells. For example, as shown inFIG. 7B, local source line SL[0] within column 0 is directly coupled toeach drain/source of transistors 210[0,0,F-2] and 210[0,0,F-1] withincolumn 0 of memory cell array 202.

Within each pillar, the drain/source of each corresponding selecttransistor 212 is coupled to drain/sources of each corresponding memorycell positioned on layers of memory cell array 202 above selecttransistor 212 by the corresponding local source line SL. For example,as shown in FIG. 7B, in row 0 and column 0, the drain/source ofcorresponding select transistor 212[0,0] positioned below layers F-2 andF-1 of memory cell array 202 is coupled to the drain/sources of memorycells 210[0,0,F-2] and 210[0,0,F-1] of corresponding layers F-2 and F-1of memory cell array 202 in pillar 750 (shown in FIG. 7B) by localsource line SL[0,0].

By including select gate array 204 in memory circuit 700, memory circuit700 can reduce the local bit line BL/local source line SL loading ofdisabled select transistors resulting in the benefits discussed abovewith respect to memory circuit 200.

FIG. 8 is a diagram of a memory circuit 800, in accordance with someembodiments.

Memory circuit 800 is a variation of memory circuit 200 of FIGS. 2A-2C.For example, select gate arrays SG[0,0] and SG*[0,0] of FIG. 2B havebeen replaced with corresponding transmission gates TG[0,0] and TG*[0,0]in FIG. 8 .

Memory circuit 800 corresponds to an embodiment of pillar 250 of memorycircuit 200, and similar detailed description is omitted. Memory circuit800 includes pillar 850, simplified for ease of illustration. Pillar 850is a variation of pillar 250 of FIGS. 2B-2C. While FIG. 8 shows a singlepillar of memory circuit 800, the features of memory circuit 800 areapplicable to each pillar in memory circuit 100-700, and are not shownfor brevity. For example, transmission gate TG[0,0] replaces each selectgate in select gate array 104 or 204, and transmission gate TG*[0,0]replaces each select gate in select gate array 106 or 206, and similardetailed description is omitted. In other words, transmission gateTG[0,0] is part of a first transmission gate array 802 that replacesselect gate array 104 or 204, and transmission gate TG*[0,0] is part ofa second transmission gate array 804 that replaces select gate array 106or 206, and similar detailed description is omitted. Each transmissiongate of the first transmission gate array 802 is configured toselectively couple the corresponding global bit line and thecorresponding column of local bit lines together. Each transmission gateof the second transmission gate array 804 is configured to selectivelycouple the corresponding global source line and the corresponding columnof local source lines together.

Pillar 850 includes one or more features of memory circuit 200 of FIG.2A for column 0 and row 0 of memory circuit 200, and similar detaileddescription is omitted.

Transmission gate TG[0,0] includes select transistor 212[0,0] and aselect transistor 812[0,0]. Select transistor 812[0,0] is similar toselect transistor 212[0,0], and similar detailed description is omitted.

Each transmission gate TG[0,0], TG[1, 0], . . . , TG[C-1, 0], . . . ,TG[0, M-1], SG[1, M-1], . . . , TG[C-1, M-1] of first transmission gatearray 802 includes a corresponding select transistor 212[0,0], 212[1,0], . . . , 212[C-1, 0], . . . , 212[0, M-1], 212[1, M-1], . . . ,212[C-1, M-1] and a corresponding select transistor 812[0,0], 812[1, 0],. . . , 812[C-1, 0], . . . , 812[0, M-1], 212[1, M-1], . . . , 812[C-1,M-1] (collectively referred to as “select transistors 812”). Selecttransistors 812 herein are denoted by 812[column number, row number].For ease of illustration, memory circuit 800 includes one column ofselect transistors 812.

Each column of select transistors 212 and 812 is configured toselectively couple the corresponding global bit line and thecorresponding column of local bit lines together. Column 0 of selecttransistors 212[0,0] 212[0,1], . . . , 212[0,M-1] and select transistors812[0,0] 812[0,1], . . . , 812[0,M-1] (not shown) are configured toselectively couple the corresponding global bit line GBL[0] and thecorresponding column of local bit lines BL[0,0], BL[0,1], . . . ,BL[0,M-1].

Each of select transistors 812 are p-type transistors. In someembodiments, each of select transistors 812 are PMOS transistors. Othertransistor types are within the scope of the present disclosure. In someembodiments, each of select transistors 812 are n-type transistors. Insome embodiments, each of select transistors 812 are NMOS transistors.

Each select transistor 812 includes a gate coupled to a correspondingselect line SGB, a drain/source coupled to at least a correspondingglobal bit line GBL and a corresponding drain/source of selecttransistor 212, and a source/drain coupled to at least a correspondingbit line BL and a corresponding source/drain of select transistor 212.

In pillar 850, the source/drain of corresponding select transistor212[0,0] and the source/drain of corresponding select transistor812[0,0] in row 0 and column 0 are coupled together, and are furthercoupled to the drains of memory cells 210[0,0,0], 210[0,0,1], . . . ,210[0,0,F-1] in row 0 and column 0 of each layer of memory cell array202 in pillar 250 by local bit line BL[0,0].

In pillar 850, the drain/source of corresponding select transistor212[0,0] and the drain/source of corresponding select transistor812[0,0] in row 0 and column 0 are coupled together, and are furthercoupled to the global bit line GBL[0].

Each gate of a corresponding row of select transistors 812 iselectrically coupled to a corresponding select line SGB[0], SGB[1], . .. , SGB[M-1] (collectively referred to as “select lines SGB”), and isconfigured to receive a corresponding select line signal SLSB[0],SLSB[1], . . . , SLSB[M-1] (collectively referred to as “select linesignal SLSB”)). Each select transistor of select transistors 812 isenabled or disabled in response to the corresponding select line signalSLSB[0], SLSB[1], . . . , SLSB[M-1] received on the corresponding selectline SGB[0], SGB[1], . . . , SGB[M-1]. In some embodiments, select linesignals SLSB are inverted from select line signals SLS and vice versa.

If enabled, select transistors 212[0,0] and 812[0,0] electrically couplethe corresponding global bit line and the corresponding column of localbit lines. If disabled, select transistors 212[0,0] and 812[0,0]electrically decouple the corresponding global bit line and thecorresponding column of local bit lines. In some embodiments, one row ofselect transistors 212 and 812 are enabled for a duration of time(between time T1-T2 in FIG. 3C), and the other rows of selecttransistors 212 and 812 are disabled for the same duration of time(between time T1-T2 in FIG. 3C).

Transmission gate TG*[0,0] includes select transistor 214[0,0] and aselect transistor 814[0,0]. Select transistor 814[0,0] is similar toselect transistor 214[0,0], and similar detailed description is omitted.

Each transmission gate TG*[0,0], TG*[1, 0], . . . , TG*[C-1, 0], . . . ,TG*[0, M-1], SG[1, M-1], . . . , TG*[C-1, M-1] of second transmissiongate array 804 includes a corresponding select transistor 214[0,0],214[1, 0], . . . , 214[C-1, 0], . . . , 214[0, M-1], 214[1, M-1], . . ., 214[C-1, M-1] and a corresponding select transistor 814[0,0], 814[1,0], . . . , 814[C-1, 0], . . . , 814[0, M-1], 214[1, M-1], . . . ,814[C-1, M-1] (collectively referred to as “select transistors 814”).Select transistors 814 herein are denoted by 814[column number, rownumber]. For ease of illustration, memory circuit 800 includes onecolumn of select transistors 814.

Each column of select transistors 214 and 814 is configured toselectively couple the corresponding global source line and thecorresponding column of local source lines together. Column 0 of selecttransistors 214[0,0] 214[0,1], . . . , 214[0,M-1] and select transistors814[0,0] 814[0,1], . . . , 814[0,M-1] (not shown) are configured toselectively couple the corresponding global source line GSL[0] and thecorresponding column of local source lines SL[0,0], SL[0,1], . . . ,SL[0,M-1].

Each of select transistors 814 are p-type transistors. In someembodiments, each of select transistors 814 are PMOS transistors. Othertransistor types are within the scope of the present disclosure. In someembodiments, each of select transistors 814 are n-type transistors. Insome embodiments, each of select transistors 814 are NMOS transistors.

Each select transistor 814 includes a gate coupled to a correspondingselect line SGB, a drain/source coupled to at least a correspondingglobal source line GSL and a corresponding drain/source of selecttransistor 214, and a source/drain coupled to at least a correspondingsource line SL and a corresponding source/drain of select transistor214.

In pillar 850, the source/drain of corresponding select transistor214[0,0] and the source/drain of corresponding select transistor814[0,0] in row 0 and column 0 are coupled together, and are furthercoupled to the sources of memory cells 210[0,0,0], 210[0,0,1], . . . ,210[0,0,F-1] in row 0 and column 0 of each layer of memory cell array202 in pillar 250 by local source line SL[0,0].

In pillar 850, the drain/source of corresponding select transistor214[0,0] and the drain/source of corresponding select transistor814[0,0] in row 0 and column 0 are coupled together, and are furthercoupled to the global source line GSL[0].

Each gate of a corresponding row of select transistors 814 iselectrically coupled to a corresponding select line SGB[0], SGB[1], . .. , SGB[M-1] of select lines SGB, and is configured to receive acorresponding select line signal SLSB[0], SLSB[1], . . . , SLSB[M-1] ofselect line signals SLSB. Each select transistor of select transistors814 is enabled or disabled in response to the corresponding select linesignal SLSB[0], SLSB[1], . . . , SLSB[M-1] received on the correspondingselect line SGB[0], SGB[1], . . . , SGB[M-1]. In some embodiments,select line signals SLSB received by transmission gates 814 is differentfrom the select line signals received by transmission gates 812.

If enabled, select transistors 214[0,0] and 814[0,0] electrically couplethe corresponding global source line and the corresponding column oflocal source lines. If disabled, select transistors 214[0,0] and814[0,0] electrically decouple the corresponding global source line andthe corresponding column of local source lines. In some embodiments, onerow of select transistors 214 and 814 are enabled for a duration of time(between time T1-T2 in FIG. 3C), and the other rows of selecttransistors 214 and 814 are disabled for the same duration of time(between time T1-T2 in FIG. 3C).

FIG. 9 is a diagram of a memory cell device 900, in accordance with someembodiments. Memory cell device 900 is usable as part or all of one ormore memory cells of memory cell array 102 or 202, discussed above withrespect to FIG. 1 or 2A-2C.

In some embodiments, memory cell device is a dual-gate (DG) thin filmtransistor (TFT). Other transistor types are within the scope of thepresent disclosure.

In some embodiments, memory cell device 900 is useable as memory cellMC[0,0,0] in a layer 0 of memory cell array 202 and memory cellMC[0,0,1] in a layer 1 of memory cell array 202. In some embodiments,memory cell device 900 has a first gate (e.g., gate layer 902) thatcorresponds to the gate of transistor 210[0,0,0] in layer 0 of memorycell array 202, and a second gate (e.g., gate layer 918) thatcorresponds to the gate of transistor 210[0,1,0] in layer 0 of memorycell array 202. Memory cell device 900 can be usable as other memorycells located on adjacent layers of memory cell array 202.

Memory cell device 900 includes a gate layer 902. In some embodiments,gate layer 902 includes a conductive material. In some embodiments, gatelayer 902 includes polysilicon, LTPS, a-Si TFT, IGZO or semiconductormaterial, or combinations thereof, or the like. In some embodiments,gate layer 902 corresponds to word line WL. In some embodiments, wordline WL includes polysilicon, LTPS, a-Si TFT, IGZO or semiconductormaterial, or combinations thereof, or the like.

Memory cell device 900 further includes an insulating layer 904 over thegate layer 902 and a gate layer 918 over an insulating layer 916. Insome embodiments, insulating layer 904 includes a ferroelectric baselayer 904 a and insulating layer 916 includes a ferroelectric base layer916 a. In some embodiments, at least insulating layer 904 or 916includes SiO, SiO₂ high-k oxide or combinations thereof, or the like. Insome embodiments, at least insulating layer 904 or 916 includes a gateoxide or the like.

The ferroelectric base layer 904 a is below a channel layer 906. Theferroelectric base layer 916 a is above the channel layer 914. In someembodiments, at least ferroelectric base layer 904 a or 916 a includesperovskite, SBT, PZT, HfZrO, HfO or combinations thereof, or the like.In some embodiments, at least ferroelectric base layer 904 a or 916 a isa layer with ferroelectric characteristics. In some embodiments, atleast insulating layer 904 or 916 is a charge-trapping base layer withcharge-trapping characteristics.

Memory cell device 900 further includes a source 908 and a drain 910 onchannel layer 906/ferroelectric base layer 904 a. The source 908 anddrain 910 are below channel layer 914/ferroelectric base layer 916 a. Insome embodiments, at least source 908 or drain 910 includes a conductivematerial. In some embodiments, a conductive material includes dopedpolysilicon, TiN, W, Cu, Co, Ru, or combinations thereof, or the like.

In some embodiments, source 908 corresponds to the source of transistor210[0,0,0] in layer 0 of memory cell array 202, and the source oftransistor 210[0,1,0] in layer 0 of memory cell array 202. In someembodiments, drain 910 corresponds to the drain of transistor 210[0,0,0]in layer 0 of memory cell array 202, and the drain of transistor210[0,1,0] in layer 0 of memory cell array 202. In some embodiments, bitline BL is coupled to the drain 910, and source line SL is coupled tothe source 908. In some embodiments, bit line BL or source line SLincludes doped polysilicon, TiN, W, Cu, Co, Ru, or combinations thereof,or the like.

Memory cell device 900 further includes a channel 906 and a channel 914.In some embodiments, at least channel 906 or 914 extends between thesource 908 and drain 910. In some embodiments, at least channel 906 or914 includes a conductive material. In some embodiments, at leastchannel 906 or 914 includes polysilicon, LTPS, a-Si TFT, IGZO orsemiconductor material, or combinations thereof, or the like. In someembodiments, insulating layer 904 is on gate layer 902, channel 906 ison insulating layer 904, source 908 and drain 910 are on channel 906,channel 914 is on source 908 and drain 910, insulating layer 916 is onchannel 914, and gate layer 918 is on insulating layer 916.

Memory cell device 900 further includes an insulating layer 912 betweensource 908 and drain 910. In some embodiments, memory cell device 900 isa 2-bit memory cell with common source and drain. In some embodiments,insulating layer 912 includes SiO, SiO₂ or combinations thereof, or thelike.

In some embodiments, gate layer 918 is over the insulating layer 916. Insome embodiments, gate layer 918 includes a conductive material. In someembodiments, gate layer 918 includes polysilicon, LTPS, a-Si TFT, IGZOor semiconductor material, or combinations thereof, or the like. In someembodiments, gate layer 918 corresponds to word line WL. In someembodiments, one or more layers of memory cell device 900 are notincluded. In some embodiments, one or more layers of memory cell device900 are divided into multiple layers.

By being included in memory circuit 100-800 discussed above with respectto FIGS. 1-8 , memory cell device 900 operates to achieve the benefitsdiscussed above with respect to memory circuit 100-800.

Method

FIG. 10 is a flowchart of a method of operating a circuit, in accordancewith some embodiments.

In some embodiments, FIG. 10 is a flowchart of a method of operating thememory circuit of FIGS. 1-9 . It is understood that additionaloperations may be performed before, during, and/or after the method 1000depicted in FIG. 10 , and that some other operations may only be brieflydescribed herein. It is understood that method 1000 utilizes features ofone or more of circuits 100, 200, 300A, 400, 500, 600, 700, 800 ormemory cell device 900, or timing diagram 300B of FIG. 3B.

In operation 1002 of method 1000, a first row of select transistors isenabled. In some embodiments, operation 1002 includes at leastreceiving, by a first selection transistor in the first row of selecttransistors, a first select line signal, and turning on the firstselection transistor in response to the first select line signal therebyelectrically coupling a first local bit line and a global bit line toeach other.

In some embodiments, the first row of select transistors of method 1000includes row 0. In some embodiments, the first selection transistor ofmethod 1000 includes selection transistor 212[0,0]. In some embodiments,the first select line signal of method 1000 includes select line signalSLS[0]. In some embodiments, the first local bit line of method 1000includes bit line BL[0,0]. In some embodiments, the global bit line ofmethod 1000 includes global bit line BL[0].

In operation 1004 of method 1000, a second row of select transistors isenabled. In some embodiments, operation 1004 includes at leastreceiving, by a second selection transistor in the second row of selecttransistors, a second select line signal, and turning on the secondselection transistor in response to the second select line signalthereby electrically coupling a first local source line and a globalsource line to each other.

In some embodiments, the second row of select transistors of method 1000includes the row of selection transistors 214 in row 0. In someembodiments, the second selection transistor of method 1000 includesselection transistor 214[0,0]. In some embodiments, the second selectline signal of method 1000 includes select line signal SLS*[0]. In someembodiments, the first local source line of method 1000 includes sourceline SL[0,0]. In some embodiments, the global source line of method 1000includes global source line SL[0].

In operation 1006 of method 1000, a third row of select transistors isdisabled. In some embodiments, operation 1006 includes at leastreceiving, by a third selection transistor in the third row of selecttransistors, a third select line signal, and turning off the thirdselection transistor in response to the third select line signal therebyelectrically decoupling a second local bit line and the global bit linefrom each other.

In some embodiments, the third row of select transistors of method 1000includes row 1. In some embodiments, the third selection transistor ofmethod 1000 includes selection transistor 212[0,1]. In some embodiments,the third select line signal of method 1000 includes select line signalSLS[1]. In some embodiments, the second local bit line of method 1000includes bit line BL[0,1].

In operation 1008 of method 1000, a fourth row of select transistors isdisabled. In some embodiments, operation 1008 includes at leastreceiving, by a fourth selection transistor in the fourth row of selecttransistors, a fourth select line signal, and turning off the fourthselection transistor in response to the fourth select line signalthereby electrically decoupling a second local source line and theglobal source line from each other.

In some embodiments, the fourth row of select transistors of method 1000includes the row of selection transistors 214 in row 1. In someembodiments, the fourth selection transistor of method 1000 includesselection transistor 214[0,1]. In some embodiments, the fourth selectline signal of method 1000 includes select line signal SLS*[1]. In someembodiments, the second local source line of method 1000 includes sourceline SL[0,1].

In operation 1010 of method 1000, a first row of memory cells is enabledin response to a first word line signal. In some embodiments, operation1010 includes at least receiving, by a first memory cell in the firstrow of memory cells, the first word line signal, and turning on thefirst memory cell in response to the first word line signal.

In some embodiments, the first row of memory cells of method 1000includes memory cells in row 0. In some embodiments, the first memorycell of method 1000 includes memory cell 210[0,0,0]. In someembodiments, the first word line signal of method 1000 includes wordline signal WL[0]_FL[0].

In operation 1012 of method 1000, a second row of memory cells isdisabled in response to a second word line signal. In some embodiments,operation 1012 includes at least receiving, by a second memory cell inthe second row of memory cells, the second word line signal, and turningoff the second memory cell in response to the second word line signal.

In some embodiments, the second row of memory cells of method 1000includes memory cells in row 1. In some embodiments, the second memorycell of method 1000 includes memory cell 210[0,1,0]. In someembodiments, the second word line signal of method 1000 includes wordline signal WL[1]_FL[0].

In operation 1014 of method 1000, the first row of select transistors isdisabled. In some embodiments, operation 1014 includes turning off thefirst selection transistor in response to the first select line signalthereby electrically decoupling the first local bit line and the globalbit line from each other.

In operation 1016 of method 1000, the second row of select transistorsis disabled. In some embodiments, operation 1016 includes turning offthe second selection transistor in response to the second select linesignal thereby electrically decoupling the first local source line andthe global source line from each other.

In operation 1018 of method 1000, the first row of memory cells isdisabled in response to the first word line signal.

By operating method 1000, the memory circuit operates to achieve thebenefits discussed above with respect to memory circuit 100-800 andmemory cell device 900. While method 1000 was described above withreference to FIGS. 1, 2A-2C and 3A-3B, it is understood that method 1000utilizes the features of one or more of FIGS. 4-7B 8 and 9.

While method 1000 was described above with reference to rows 0-1, column0 and layers 0 and 1 of memory cell array 202, it is understood thatmethod 1000 applies to each row, each column and each layer of memorycell array 202.

In some embodiments, one or more of the operations of method 1000 is notperformed. Furthermore, various PMOS or NMOS transistors shown in FIGS.2A-9 are of a particular dopant type (e.g., N-type or P-type) are forillustration purposes. Embodiments of the disclosure are not limited toa particular transistor type, and one or more of the PMOS or NMOStransistors shown in FIGS. 2A-9 can be substituted with a correspondingtransistor of a different transistor/dopant type. Similarly, the low orhigh logical value of various signals used in the above description isalso for illustration. Embodiments of the disclosure are not limited toa particular logical value when a signal is activated and/ordeactivated. Selecting different logical values is within the scope ofvarious embodiments. Selecting different numbers of transistors in FIG.2A-10 is within the scope of various embodiments.

It will be readily seen by one of ordinary skill in the art that one ormore of the disclosed embodiments fulfill one or more of the advantagesset forth above. After reading the foregoing specification, one ofordinary skill will be able to affect various changes, substitutions ofequivalents and various other embodiments as broadly disclosed herein.It is therefore intended that the protection granted hereon be limitedonly by the definition contained in the appended claims and equivalentsthereof.

One aspect of this description relates to a method of operating a memorycircuit. In some embodiments, the method includes enabling a first rowof select transistors, disabling a second row of select transistors,enabling a first row of memory cells in response to a first word linesignal, and disabling a second row of memory cells in response to asecond word line signal. In some embodiments, enabling the first row ofselect transistors includes turning on a first select transistor in thefirst row of select transistors in response to a first select linesignal thereby electrically coupling a first local bit line and a globalbit line to each other. In some embodiments, disabling the second row ofselect transistors includes turning off a second select transistor inthe second row of select transistors in response to a second select linesignal thereby electrically decoupling a second local bit line and theglobal bit line from each other. In some embodiments, the method furtherincludes enabling a third row of select transistors, the enabling thethird row of select transistors includes turning on a third selectiontransistor in the third row of select transistors in response to a thirdselect line signal thereby electrically coupling a first local sourceline and a global source line to each other. In some embodiments, themethod further includes disabling a fourth row of select transistors,the disabling the fourth row of select transistors includes turning offa fourth selection transistor in the fourth row of select transistors inresponse to a fourth select line signal thereby electrically decouplinga second local source line and the global source line from each other.In some embodiments, the method further includes disabling the first rowof select transistors, the disabling the first row of select transistorsincludes turning off the first selection transistor in response to thefirst select line signal thereby electrically decoupling the first localbit line and the global bit line from each other. In some embodiments,the method further includes disabling the third row of selecttransistors, the disabling the third row of select transistors includesturning off the third selection transistor in response to the thirdselect line signal thereby electrically decoupling the first localsource line and the global source line from each other.

Another aspect of this description relates to a method of operating amemory circuit. In some embodiments, the method includes enabling afirst row of selection transistors, disabling a second row of selectiontransistors, enabling a first row of memory cells in response to a firstword line signal, and disabling a second row of memory cells in responseto a second word line signal. In some embodiments, the enabling thefirst row of selection transistors includes turning on a first selectiontransistor in the first row of selection transistors in response to afirst selection line signal thereby electrically coupling a first localsource line and a global source line to each other. In some embodiments,the disabling the second row of selection transistors includes turningoff a second selection transistor in the second row of selectiontransistors in response to a second selection line signal therebyelectrically decoupling a second local source line and the global sourceline from each other.

Still another aspect of this description relates to a method ofoperating a memory circuit. In some embodiments, the method includesenabling a first row of select transistors, enabling a second row ofselect transistors, enabling a first row of memory cells in response toa first word line signal, and disabling a second row of memory cells inresponse to a second word line signal. In some embodiments, the enablingthe first row of select transistors includes turning on a first selecttransistor in the first row of select transistors in response to a firstselect line signal thereby electrically coupling a first local bit lineand a global bit line to each other. In some embodiments, the enablingthe second row of select transistors includes turning on a second selecttransistor in the second row of select transistors in response to asecond select line signal thereby electrically coupling a first localsource line and a global source line to each other.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method of operating a memory circuit, themethod comprising: enabling a first row of select transistors, theenabling the first row of select transistors comprises: turning on afirst select transistor in the first row of select transistors inresponse to a first select line signal thereby electrically coupling afirst local bit line and a global bit line to each other; disabling asecond row of select transistors, the disabling the second row of selecttransistors comprises: turning off a second select transistor in thesecond row of select transistors in response to a second select linesignal thereby electrically decoupling a second local bit line and theglobal bit line from each other; enabling a first row of memory cells inresponse to a first word line signal; and disabling a second row ofmemory cells in response to a second word line signal.
 2. The method ofclaim 1, further comprising: enabling a third row of select transistors,the enabling the third row of select transistors comprises: turning on athird select transistor in the third row of select transistors inresponse to a third select line signal thereby electrically coupling afirst local source line and a global source line to each other.
 3. Themethod of claim 2, further comprising: disabling a fourth row of selecttransistors, the disabling the fourth row of select transistorscomprises: turning off a fourth select transistor in the fourth row ofselect transistors in response to a fourth select line signal therebyelectrically decoupling a second local source line and the global sourceline from each other.
 4. The method of claim 3, further comprising:disabling the first row of select transistors, the disabling the firstrow of select transistors comprises: turning off the first selecttransistor in response to the first select line signal therebyelectrically decoupling the first local bit line and the global bit linefrom each other.
 5. The method of claim 4, further comprising: disablingthe third row of select transistors, the disabling the third row ofselect transistors comprises: turning off the third select transistor inresponse to the third select line signal thereby electrically decouplingthe first local source line and the global source line from each other.6. The method of claim 5, wherein the enabling the first row of memorycells in response to the first word line signal, comprises: receiving,by a first memory cell in the first row of memory cells, the first wordline signal; and turning on the first memory cell in response to thefirst word line signal.
 7. The method of claim 6, wherein the disablingthe second row of memory cells in response to the second word linesignal, comprises: receiving, by a second memory cell in the second rowof memory cells, the second word line signal; and turning off the secondmemory cell in response to the second word line signal.
 8. The method ofclaim 1, further comprising: disabling the first row of memory cells inresponse to the first word line signal.
 9. The method of claim 8,wherein the disabling the first row of memory cells in response to thefirst word line signal, comprises: receiving, by a first memory cell inthe first row of memory cells, the first word line signal; and turningoff the first memory cell in response to the first word line signal. 10.A method of operating a memory circuit, the method comprising: enablinga first row of selection transistors, the enabling the first row ofselection transistors comprises: turning on a first selection transistorin the first row of selection transistors in response to a firstselection line signal thereby electrically coupling a first local sourceline and a global source line to each other; disabling a second row ofselection transistors, the disabling the second row of selectiontransistors comprises: turning off a second selection transistor in thesecond row of selection transistors in response to a second selectionline signal thereby electrically decoupling a second local source lineand the global source line from each other; enabling a first row ofmemory cells in response to a first word line signal; and disabling asecond row of memory cells in response to a second word line signal. 11.The method of claim 10, further comprising: disabling the first row ofselection transistors after enabling the first row of memory cells. 12.The method of claim 11, wherein the disabling the first row of selectiontransistors after enabling the first row of memory cells comprises:turning off the first selection transistor in response to the firstselection line signal thereby electrically decoupling the first localsource line and the global source line from each other.
 13. The methodof claim 11, further comprising: enabling the second row of selectiontransistors after disabling the first row of selection transistors. 14.The method of claim 13, wherein the enabling the second row of selectiontransistors after disabling the first row of selection transistorscomprises: turning on the second selection transistor in the second rowof selection transistors in response to the second selection line signalthereby electrically coupling the second local source line and theglobal source line together.
 15. The method of claim 10, wherein thefirst row of memory cells is on a first layer of the memory circuit; andthe enabling the first row of memory cells in response to the first wordline signal, comprises: receiving, by a first memory cell on the firstlayer of the memory circuit and in the first row of memory cells, thefirst word line signal; and turning on the first memory cell in responseto the first word line signal.
 16. The method of claim 15, wherein thesecond row of memory cells is on the first layer of the memory circuit;and the disabling the second row of memory cells in response to thesecond word line signal, comprises: receiving, by a second memory cellon the first layer of the memory circuit and in the second row of memorycells, the second word line signal; and turning off the second memorycell in response to the second word line signal.
 17. The method of claim15, further comprising: disabling the first row of memory cells inresponse to the first word line signal.
 18. The method of claim 17,wherein the disabling the first row of memory cells in response to thefirst word line signal, comprises: receiving, by the first memory cellin the first row of memory cells, the first word line signal; andturning off the first memory cell in response to the first word linesignal.
 19. The method of claim 17, further comprising: enabling thefirst row of memory cells on a second layer of the memory circuit inresponse to a third word line signal, the second layer being above thefirst layer.
 20. A method of operating a memory circuit, the methodcomprising: enabling a first row of select transistors, the enabling thefirst row of select transistors comprises: turning on a first selecttransistor in the first row of select transistors in response to a firstselect line signal thereby electrically coupling a first local bit lineand a global bit line to each other; turning on a second selecttransistor in the first row of select transistors in response to asecond select line signal thereby electrically coupling a first localsource line and a global source line to each other; disabling a secondrow of select transistors, the disabling the second row of selecttransistors comprises: turning off a second select transistor in thesecond row of select transistors in response to a third select linesignal thereby electrically decoupling a second local source line andthe global source line from each other; enabling a first row of memorycells in response to a first word line signal; and disabling a secondrow of memory cells in response to a second word line signal.